ALD 2017, Denver, CO

July 15, 2017 to July 18, 2017

Schrödinger scientists will be presenting and attending the International Conference on Atomic Layer Deposition 2017 in Boulder, Colorado.

Dr. Alexander Goldberg will be presenting "Theoretical Study of Si‐N Film Atomic Layer Deposition Mechanism with Hydrazine and Diclorosilane Precursors and their Derivatives” on Sunday, July 16 at 5:30pm. 

Dr. Thomas Mustard will be presenting "Quantum Chemical Design for Kinetically Enhanced ALD Precursors" on Monday, July 17 at 5:30pm. 

Both presentations will take place in the Plaza Exhibit space. 
For more information, please visit the conference website