FT-IR, FT-Raman and NMR Characterization of 2-isopropyl-5-methylcyclohexyl quinoline-2-carboxylate and Investigation of its Reactive and Optoelectronic Properties by Molecular Dynamics Simulations and DFT Calculations Posted on August 30, 2016January 7, 2025 by Anonymous
High-throughput Quantum Chemistry and Virtual Screening for OLED Material Components Posted on August 30, 2016December 11, 2024 by Anonymous
Surface Oxide Characterization and Interface Evolution in Atomic Layer Deposition of Al2O3 on InP(100) Studied by in Situ Infrared Spectroscopy Posted on August 30, 2016December 11, 2024 by Anonymous
Fluorine Coatings for Nanoimprint Lithography Masks Posted on August 30, 2016January 7, 2025 by Anonymous
Atomic Layer Deposition of Dopants for Recoil Implantation in finFET Sidewalls Posted on August 30, 2016January 7, 2025 by Anonymous
Role of Interfacial Aluminum Silicate and Silicon as Barrier Layers for Atomic Layer Deposition of Al2O3 Films on Chemically Cleaned InP (100) Surfaces Posted on August 30, 2016January 7, 2025 by Anonymous
Chemical Nature and Control of High-k Dielectric/III-V Interfaces Posted on August 30, 2016January 7, 2025 by Anonymous
Discovery of New Anode SEI Forming Additives Using an in silico Evolutionary Approach Posted on August 30, 2016January 7, 2025 by Anonymous
Ethylenediamine Grafting on Oxide-free H-, 1/3 ML F- and Cl-terminated Si(111) Posted on August 30, 2016January 7, 2025 by Anonymous
Optical Simulations for Fractional Fluorine Terminated Coatings on Nanoimprint Lithography Masks Posted on August 30, 2016January 7, 2025 by Anonymous
Atomic Layer Deposition of Boron-Containing Films using B2F4 Posted on August 30, 2016January 7, 2025 by Anonymous